Geant4 physics processes for microdosimetry and secondary electron emission simulation: Extension of MicroElec to very low energies and 11 materials (C, Al, Si, Ti, Ni, Cu, Ge, Ag, W, Kapton and SiO2)

Several improvements are added to the MicroElec extension of Geant4 in order track very low energy electrons, protons and ions different materials. The interaction processes for extended down 1 keV/nucleon, a few eVs corresponding electron affinity or work-function selected material. Surface electrons added, along with electron–phonon interactions SiO2. models validated silicon several new materials (C, Al, Ti, Ni, Cu, Ge, Ag, W, SiO2 Kapton), which significantly broadens capabilities MicroElec. Developed microdosimetry simulation, module can now also be used secondary emission applications.